Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
نویسندگان
چکیده
The use of thin-films made by atomic layer deposition (ALD) is increasing in the field optical sensing. ALD TiO2 has been widely characterized for its physical and properties, but systematic information about influence thermal history to mechanical properties film lacking. Optical applications require planar surface tunability refractive index residual stress. In addition, such as elastic modulus hardness performance layer, especially, when optics integrated with microelectromechanical systems. this work, density, elemental analysis, stress, as-grown thin films on silicon were studied at temperature range from 80 350 °C post-ALD annealing was annealed up 900 °C. under tensile stress scale hundreds MPa. depended both thickness a complex way, onset crystallization increased Films grown 110 300 able withstand 420 without major change or extinction coefficient. Elastic upon temperature. results presented here help improve design devices choosing desired further budget so that maintain their features.
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2021
ISSN: ['1879-2731', '0040-6090']
DOI: https://doi.org/10.1016/j.tsf.2021.138758